[1] Von der Linde D, Sokolowski-Tinten K, Bialkowski J. Laser-solid interaction in the femtosecond time regime[J]. Appl Surf Sci, 1997, 109: 1-10.
[2]
[3]
[4] Chen Xiangqian, Peng Yan, Fang Dan, et al. Micro-structure silicon fabricated by femtosecond laser pulse for infrared sensor[J]. Infrared and LaserEngineering, 2014, 43(2): 398-403. (in Chinese)陈向前, 彭滟, 方丹, 等. 真空环境下飞秒激光制备的微构造硅的吸收和退火特性[J]. 红外与激光工程, 2014, 43(2): 398-403.
[5] Tian Xiuqin, Xiao Si, Tao Shaohua, et al. Damage threshold research of monocrystalline silicon solar cells under femtosecond laser illumination[J]. Infrared and Laser Engineering, 2014, 43(3): 676-680. (in Chinese)田秀芹, 肖思, 陶少华, 等. 飞秒超短脉冲激光对硅太阳能电池的损伤阈值研究[J]. 红外与激光工程, 2014, 43(3): 676-680.
[6]
[7]
[8] Marshall C D, Speth J A, Payne S A. Induced optical absorption in gamma, neutron and ultraviolet irradiated fused quartz and silica[J]. J Non-Crystalline Solids, 1997, 212(1): 59-73.
[9]
[10] Paterson C, Holmes A S, Smith R W. Excimer laser ablation of microstructures: a numerical model[J]. J Appl Phys, 1999, 86(11): 6538-6546.
[11] Jiang L, Tsai H L. Prediction of crater shape in femtosecond laser ablation of dielectrics[J]. Journal of Physics D: Applied Physics, 2004, 37(10): 1492.
[12]
[13] Ma Fajun, Tian Youwei, He Feng, et al. Ultra-short pulse laser-induced damage in transparent materials[J]. Laser Technology, 2005, 29(5): 507-510. (in Chinese)马法君, 田友伟, 何峰, 等. 超短脉冲激光对透明材料的破坏[J]. 激光技术, 2005, 29(5): 507-510.
[14]
[15] Wang Wenjun. Study of shape and morphology control in femtosecond laser fabrication of metals[D]. Xi'an: Xi'an Jiaotong University, 2008. (in Chinese)王文君. 飞秒激光金属加工中的形状及形貌控制研究[D]. 西安: 西安交通大学, 2008.
[16]
[17]
[18] Du D, Liu X, Korn G, et al. Laser-induced breakdown by impact ionization in SiO2 with pulse widths from 7 ns to 150 fs[J]. Appl Phys Lett, 1994, 64(23): 3071-3073.
[19] Joglekar A P, Liu H, Spooner G J, et al. A study of the deterministic character of optical damage by femtosecond laser pulses and applications to nanomachining[J]. Applied Physics B, 2003, 77(1): 25-30.
[20]
[21]
[22] Ashkenasi D, Lorenz M, Stoian R, et al. Surface damage threshold and structuring of dielectrics using femtosecond laser pulses: the role of incubation[J]. Appl Surf Sci, 1999, 150(1-4): 101-106.
[23]
[24] Lenzner M, Krger J, Kautek W, et al. Precision laser ablation of dielectrics in the 10-fs regime[J]. Appl Phys A, 1999, 68(3): 369-371.
[25] Wu A Q, Chowdhury I H, Xu X F. Femtosecond laser absorption in fused silica: Numerical and experimental investigation[J]. Phy Rev B, 2005, 72: 085128.
[26]
[27]
[28] Niso F Di, Gaudiuso C, Sibillano T, et al. Influence of the repetition rate and pulse duration on the incubation effect in multiple-shots ultrafast laser ablation of steel[J]. Physics Procedia, 2013, 41: 691-700.
[29]
[30] Fan H C, Sun J, Longtin J P. Plasma absorption of femtosecond laser pulses in dielectrics[J]. Transaction-American Society of Mechanical Engineers Journal of Heat Transfer, 2002, 124(2): 275-283.
[31] Jiang L, Tsai H L. Plasma modeling for ultrashort pulse laser ablation of dielectrics[J]. Journal of Applied Physics, 2006, 100(2): 023116-023116-7.
[32]
[33] Yang Chengjuan, Mei Xuesong, Wang Wenjun, et al. Femtosecond laser ablation on gold-chromium film[J]. Infrared and Laser Engineering, 2011, 40(1): 61-65. (in Chinese)