[1] Xue Qunji, Wang Liping. Thin Film Materials of Carbon-base DLC[M]. Beijing:Science Press, 2012. (in Chinese)薛群基, 王立平. 类金刚石碳基薄膜材料[M]. 北京:科学出版社, 2012.
[2] Liu Lei, Wang Tao, Huang Jinglin, et al. Diamond-like carbon thin films with high density and low internal stress deposited by coupling DC/RF magnetron sputtering[J]. Diamond Related Materials, 2016, 70(1):151-158.
[3] Cheng Yong. Technology of Diamond-like Carbon Film Prepared by Pulsed Laser Deposition[M]. Beijing:Science Press, 2017. (in Chinese)程勇. 脉冲激光沉积类金刚石膜技术[M]. 北京:科学出版社, 2017.
[4] Cheng Yong, Lu Yimin, Guo Yanlong, et al. Development of function films prepared by pulsed laser deposition technology[J]. Laser Optoelectronics Progress, 2015, 52(12):120003. (in Chinese)程勇, 陆益敏, 郭延龙, 等. 脉冲激光沉积功能薄膜的研究进展[J]. 激光与光电子学进展, 2015, 52(12):120003.
[5] de Julian Fernandez C, Vassent J L, Givord D. Thin film deposition by magnetic field-assisted pulsed laser assembly[J]. Applied Surface Science, 1999, 138-139:150-154.
[6] Hiroharu Kawasaki, Kazuya D, Satoshi Hiraishi, et al. Effects of cross-magnetic field on thin film preparation by pulsed Nd:YAG laser deposition[J]. Thin Solid Films, 2000, 374:278-281.
[7] 戴建明, 张科军, 邹建, 等. 强磁场辅助脉冲激光沉积系统:中国, ZL201410033519[P]. 2014-05-07.
[8] 宁廷银, 周岳亮, 赵嵩卿, 等. 一种具有可控磁场的脉冲激光沉积制膜系统:中国, ZL200610001808.7[P]. 2006-07-20.
[9] Lu Yimin, Huang Guojun, Guo Yanlong, et al. Improved design and experiment for preparing uniform optical DLC film by large area PLD[J]. Acta Armamentarii, 2017, 38(3):555-560. (in Chinese)陆益敏, 黄国俊, 郭延龙, 等. 激光沉积大面积均匀类金刚石膜的设计改进及实验[J]. 兵工学报, 2017, 38(3):555-560.
[10] Wan Qiang, Lu Yimin, Mi Chaowei, et al. Research on antireflective and protective diamond-like carbon film deposited by 248 nm nanosecond laser[J]. Laser Optoelectronics Progress, 2015, 52(9):093101. (in Chinese)万强, 陆益敏, 米朝伟, 等. 248nm纳秒激光沉积类金刚石增透保护膜的工艺研究[J]. 激光与光电子进展, 2015, 52(9):093101.
[11] Neeraj Dwivedi, Sushil Kumar, Hitendra K Malik. Strange hardness characteristic of hydrogenated diamond-like carbon thin film by plasma enhanced chemical vapor deposition process[J]. Appl Phys Lett, 2013, 102:011917.