| [1] | Liu Huasong, Fu Xuan, Wang Lishuan, et al. Characterization of optical properties of weak absorption thin film [J]. Infrared and Laser Engineering, 2013, 42(8): 2108-2114. (in Chinese) doi: 10.3969/j.issn.1007-2276.2013.08.032 |
| [2] | Feng Yidong, Yu Tianyan, Liu Dingquan. Influence of deposition process on reliability of YbF3 thin films [J]. Acta Optica Sinica, 2018, 38(7): 0731002. (in Chinese) |
| [3] | Xu Lingmao, He Yanchun, Zheng Jun, et al. Infrared optical properties of yttrium fluoride thin films at low temperature [J]. China Surface Engineering, 2019, 32(4): 151-155. (in Chinese) |
| [4] | Zhang Yaoping, Zhang Yundong, Ling Ning, et al. Effect of substrate temperature on defects and optical properties of YbF3 thin films [J]. Optical Instruments, 2006(1): 93-96. (in Chinese) doi: 10.3969/j.issn.1005-5630.2006.01.020 |
| [5] | Ling Xiulan, Huang Wei. Effects of process parameters and deposition methods on defects of ZnS/YbF3 thin films [J]. Optical Instruments, 2006, 28(5): 71-74. (in Chinese) |
| [6] | Wang Duoshu, Li Youlu, Li Kaipeng, et al. Research method of the temperature characteristic of infrared thin-films [J]. Infrared and Laser Engineering, 2018, 47(4): 0404006. (in Chinese) |
| [7] | Li Wei, Jin Chengyu. Elliptic polarization data analysis method for thin film materials [J]. Chinese Journal of Spectroscopy Laboratory, 2010, 27(1): 66-76. (in Chinese) doi: 10.3969/j.issn.1004-8138.2010.01.014 |
| [8] | Amotchkina T, Trubetskov M, Hahner D, et al. Characterization of e-beam evaporated Ge, YbF3, ZnS, and LaF3 thin films for laser-oriented coatings [J]. Applied Optics, 2020, 59(5): A40. doi: 10.1364/AO.59.000A40 |
| [9] | Liu H, Li S, Chen D, et al. Study on broadband optical constants of yttrium fluoride thin films deposited by electron beam evaporation [J]. Optik - International Journal for Light and Electron Optics, 2019, 205: 163548. |
| [10] | Ji Yiqin, Liu Huasong, Zhang Yanmin. Measurement and analysis of optical film constants [J]. Infrared and Laser Engineering, 2006, 35(5): 513-518. (in Chinese) doi: 10.3969/j.issn.1007-2276.2006.05.003 |
| [11] | Li Kaipeng, Wang Duoshu, Li Chen, et al. Study on optical thin film parameters measurement method [J]. Infrared and Laser Engineering, 2015, 44(3): 1048-1052. (in Chinese) doi: 10.3969/j.issn.1007-2276.2015.03.047 |
| [12] | Zhong Disheng, Wang Luqhuan, Yu Yingzhi. Measurement of optical constants of thin films by spectrophotometry [J]. Journal of Liaoning University (Natural Science Edition), 1996(2): 1-13. (in Chinese) |
| [13] | Shen Weidong, Liu Xu, Zhu Yong, et al. Determination of optical constants and thickness of semiconductor thin films using transmittance test curve [J]. Acta Semiconductors, 2005(2): 335-340. (in Chinese) doi: 10.3321/j.issn:0253-4177.2005.02.022 |
| [14] | Qin Yang, Zhang Rongfu. Preparation of ytterbium fluoride films at different temperatures [J]. Optical Instruments, 2018(3): 40-94. (in Chinese) |