[1]
|
|
[2]
|
Ek strom C R, Keith D W, Pri tchard D E. Atom optics using microfabricated structures [J]. Applied Physics B: Lasers and Optics, 1992, 54(5): 369-374. |
[3]
|
McClelland J J, Scheinfein M R. Laser focusing of atoms: a particle-o ptics approach [J]. J Opt Soc Am B, 1991, 8 (9):1974-1986. |
[4]
|
|
[5]
|
Dalibard J, Cohen-Tannoudji C. Laser cooling below the Doppler limit by polarization gradients: simple theoretical models[J]. J Opt Soc Am B, 1989, 6(11): 2023-2045. |
[6]
|
|
[7]
|
Timp G, Behringer R E, Tennant DM, et al. Using light as a lens for submicron, neutral-atom lithography [J]. Physical Review Letters, 1992, 69(11): 1636-1639. |
[8]
|
|
[9]
|
McClelland J J, Scholten R E, Palm E C, et al. Laser-focused atomic deposition[J]. Science, 1993, 262(5135): 877-880. |
[10]
|
|
[11]
|
Jurdik E, Bentivegna F, Petukhov A V, et al. Deposition of magnetic nanostructures of atomic lithography: semiclassical simulation[J]. Annales De Physique, 1998, 23: 195-196. |
[12]
|
|
[13]
|
Jurgens D, Greiner A, Stutzle R, et al. Quantum features in atomic nanofabrication using exactly resonant standing waves[J]. Physical Review Letters, 2004, 93(23): 237402-1-4. |
[14]
|
|
[15]
|
|
[16]
|
AndersonWR, Bradley C C, McClelland J J, et al. Minimizing feature width in atom optically fabricated chromium nano-structures[J]. Physical Review A, 1999, 59(3): 2476-2485. |
[17]
|
|
[18]
|
McGowan R W, Giltner D M, Lee S A. Light force cooling,focusing, and nanometer-scale deposition of aluminum atoms[J]. Opt Lett, 1995, 20(24): 2535-2537. |
[19]
|
|
[20]
|
Ohmukai R, Urabe S, Watanabe M. Atom lithography with ytterbium beam [J]. Applied Physics B-Lasers and Optics,2003, 77(4): 415-419. |
[21]
|
|
[22]
|
Sligte E te, Smeets B, Stam K M R van der, et al. Atom lithography of Fe [J]. Applied Physics Letters, 2004, 85 (19):4493-4495. |
[23]
|
Deng X, Ma Y, Zhang P P, et al. Investigation of shadow effect in laser-focused atomic deposition[J]. Applied Surface Science,2012, 261: 464-469. |
[24]
|
|
[25]
|
Zhang Wentao, Li Tongbao. Analysis of nanometrology andatom photolithography [J]. Journal of Appied Optics, 2006, 27(3): 242-245. (in Chinese) |
[26]
|
|
[27]
|
|
[28]
|
Ma Yan, Zhang Baowu, Zheng Chunlan, et al. The preliminary result of laser-focused Cr atomic deposition for fabricating nanostructure [J]. Acta Phys Sin, 2007, 56 (3):1365-1369. (in Chinese) |
[29]
|
Ma Y, Li T B, Wu W, et al. Laser-focused atomic deposition for nanoscale grating[J]. Chin Phys Lett, 2011, 28(7): 073202. |
[30]
|
|
[31]
|
Yin C, Qian J, Zhang X P, et al. Frequency stabilization using polarization spectroscopy and Cr-He hollow cathode discharge[J]. Chin Phys Lett, 2011, 28(9): 094204. |
[32]
|
|
[33]
|
Jiao Xiaoguang, Yin Cong, Shi Chunying, et al. Thermometry of Cr laser cooling via knife-edge[J]. Zhongguo Jiguang/Chinese Journal of Lasers, 2011, 38(7): 0708004. (in Chinese) |
[34]
|
|
[35]
|
Wang Jianbo, Qian Jin, Yin Cong, et al. Method of identifying the relative position between standing wave of laser light and substrate in atom lithography [J]. Acta Phys Sin, 2012, 61(19):190601. (in Chinese) |