非绝热近场光学诱导平滑硅表面微结构的电场模拟

孙晓雁; 沈正祥; 童广德; 张锦龙; 王占山

非绝热近场光学诱导平滑硅表面微结构的电场模拟

孙晓雁^1,2,
沈正祥^1,2,
童广德^1,2,3,
张锦龙^1,2,
王占山^1,2

1.
先进微结构材料教育部重点实验室,上海200092;
2.
同济大学物理科学与工程学院精密光学工程技术研究所,上海200092;
3.
上海无线电设备研究所电磁散射国家重点实验室,上海200092

基金项目:

国家自然科学基金（11105099，61205124，61235011）;科技部国家重大科学仪器设备开发专项（2012YQ04016403）

详细信息

作者简介:
孙晓雁（1987-），女，硕士生，主要从事光学加工及仿真模拟等相关方面研究。Email：sunxiaoyan0405@126.com；沈正祥（1980-），男，副教授，博士生导师，主要从事先进光学制造和检测技术及光学设计等方面研究。Email：shenzx@tongji.edu.cn

孙晓雁（1987-），女，硕士生，主要从事光学加工及仿真模拟等相关方面研究。Email：sunxiaoyan0405@126.com；沈正祥（1980-），男，副教授，博士生导师，主要从事先进光学制造和检测技术及光学设计等方面研究。Email：shenzx@tongji.edu.cn

中图分类号: O432.1⁺2

Simulation of electric field modulated by silicon-microstructure during non-adiabatic near-field optical etching process

1.
Key Laboratory of Advanced Micro-structure Materials,Ministry of Education,Shanghai 200092,China;
2.
Institute of Precision Optical Engineering,School of Physics Science and Engineering,Tongji University,Shanghai 200092,China;
3.
Science and Technology on Electromagnetic Scattering Laboratory,Shanghai Institute of Radio Equipment,Shanghai 200092,China

摘要: 如何进一步降低超光滑光学元件表面缺陷是现代超精密光学元件制作技术研究的热点之一。在传统抛光方法的基础上，引入非绝热近场光学诱导平滑硅表面微结构这一新型方法，进一步去除超光滑抛光表面残留的纳米级表面微缺陷，降低表面粗糙度。通过建立超光滑硅表面的微结构几何模型，采用时域有限差分法对表面微结构凸起在532 nm 激光作用下的局域电场增强进行数值模拟。对比不同尺度的微结构所激发的最大电场强度表明，在基底峰谷值小于25.5 nm 时，随微结构尺度递增，所激发的局域电场强度最大值约呈线性增长；随微结构倾斜率的逐渐递增，电场强度最大值也呈递增趋势。通过对激光诱导表面微结构调制电场的数值模拟，构建了硅表面微结构诱导平滑的物理图像，为描绘激光辐照下非绝热近场光学诱导平滑表面微结构的物理过程提供了有力的理论支持。
- 近场光学 /
- 超光滑 /
- 时域有限差分 /
- 电场模拟 /
- 光化学反应
Abstract: How to reduce the micro-defects of supersmooth optical surface is one of the research hotspots of manufacturing technology of ultra-precision optical element. A kind of novel precision optical fabrication method called non-adiabatic near-field optical induced smoothing surface microstructure was introduced to remove the surface scratches and digs after conventional polishing process. After establishing the geometry models of microstructures on supersmooth surfaces of silicon, the electric field excited by microstructure under the irradiation of 532 nm laser was numerical simulated by finite difference time domain (FDTD). From the comparison of the maximum intensity of the electric field excited by the microstructure with different sizes, it can be seen that the maximum of local electric field intensity approximately increase linearly with the scale of the microstructure increase. It also shows an increasing trend with gradient of microstructure increase while the peak value is less than 25.5 nm. The physics map of the smoothing of microstructure on silicon surface is described by the numerical simulation of electric field modulated by microstructure under laser irradiation, which gives a way to explain the non-adiabatic near-field optical etching process.
- near-field optics /
- ultra-smooth /
- finite difference time domain /
- electric field simulation /
- photochemical reaction

[1]
[2]	Sakharov V K. Model of lock-in in a ring laser and asemiconductor laser gyro[J]. Optics Quantum Electrics, 2011,56: 1135-1141.
[3]	Accadia T, Acernese F, Antonucci F, et al. Performance of theVirgo interferometer longitudinal control system during thesecond science run[J]. Astroparticle Physics, 2011, 34: 521-527.
[4]
[5]	Matsugi A, Miyoshi A. Kinetics of the self-reactions ofbenzyl and o-xylyl radicals studied by cavity ring-downspectroscopy[J]. Chem Phys Lett, 2012, 521: 26-30.
[6]
[7]
[8]	George J, Knollenberg B. Dual ion beam sputteringdeposition for low loss mirrors [J]. Laser Focus World,2004, 40: 79-84.
[9]
[10]	Tesar A A, Brown N J, Taylor J R, et al. Subsurfacepolishing damage of fused silica: Nature and effect on laserdamage of coated surfaces[C]//SPIE, 1990, 1441: 154-172.
[11]
[12]	Jrg Steinert, Stefan Gliech, Andreas Wuttig, et al. Advancedmethods for surface and subsurface defect characterization ofoptical components [C]//SPIE, 2000, 4099: 290-298.
[13]	Mimura H, Yumoto H, Matsuyama S, et al. Efficientfocusing of hard x rays to 25 nm by a total reflection mirror[J]. Applied Physics Letter, 2007, 90: 051903.
[14]
[15]	Mimura1 H, Handa S, Kimura T, et al. Breaking the 10 nmbarrier in hard-X-ray focusing [J]. Nature Physics, 2010, 6:122-125.
[16]
[17]
[18]	Kiontke S, Demmler M, Zeuner M, et al. Ion Beam Figuring(IBF) for high Precision Optics becomes affordable [C]//SPIE, 2010, 7786: 77860F.
[19]	Paul R D, Donald G, StephenH, et al. System formagnetorheological finishing of substrates, US: US5951369A[P].1999-09-14.
[20]
[21]
[22]	Kristian H. Apparatus for modifying the surface of the eyethrough large beam laser polishing and method of controllingthe apparatus[P]. US: US5683379A, 1997-11-04.
[23]
[24]	Mori Y, Yamauchi K, Endo K. Elastic emission machining[J]. Precision Engineerings, 1987, 9(3): 123-128.
[25]
[26]	Wysocki G, Dai S T, Brandstetter T, et al. Etching ofcrystalline Si in Cl2 atmosphere by means of an optical fibertip[J]. Applied Physics Letters, 2001, 79(2): 159-161.
[27]
[28]	Kawazoe T, Kobayashi K, Takubo S, et al. Nonadiabaticphotodissociation process using an optical near fields[J]. TheJournal of Chemical Physics, 2005, 122: 024715.
[29]	Yatsui T, Ohtsu M. Production of size-controlled Sinanocrystals using self-organized optical near-field chemicaletchings [J]. Applied Physics Letters, 2009, 95 (4): 043104-043104-3.
[30]
[31]	Naruse M, Yatsui T, Nomura W, et al. Analysis of surfaceroughness of optical elements planarized by nonadiabaticoptical near-field etchings [J]. Journal of Applied Physics,2009, 105(6): 063516-063516-4.
[32]
[33]
[34]	Takashi Y, Motoichi O. Nanophotonic fabrication in sub-nm scale[C]//SPIE, 2010, 7586: 75860D-1-75860D-8.
[35]
[36]	Zhu Xing. Near-field optical and near-field optical microscope[J]. Journal of Peking University: Natural Science, 1997,33(3): 394-407. (in Chinese)朱星. 近场光学与近场光学显微镜[J]. 北京大学学报: 自然科学版, 1997, 33(3): 394-407.
[37]
[38]	Yatsui T, Nomura W, Naruse M, et al. Realization of anatomically flat surface of diamond using dressed photon-phonon etchings [J]. Journal of Physics D: Applied Physics,2012, 45(47): 475302.
[39]
[40]	Zhou Qin g, Zhu Xin, Li Hongfu. Intensity distribution ofprobe in the near-field optical [J]. Acta Physica Sinica,2000, 49(2): 210-214. (in Chinese)周庆, 朱星, 李宏福. 近场光学中光纤探针的光强分布[J].物理学报, 2000, 49(2): 210-214.
[41]	Krug II J T, Snchez E J, Xie X S, et al. Design of near-field optical probes with optimal field enhancement by finitedifference time domain electromagnetic simulations [J]. TheJournal of Chemical Physics, 2002, 116: 10895.

[1]	张鹏辉, 赵扬, 李鹏, 周志权, 白雪, 马健. 基于有限元法的激光声磁检测系统优化研究 . 红外与激光工程, 2022, 51(7): 20210533-1-20210533-9. doi: 10.3788/IRLA20210533
[2]	孙侨东, 黄鑫宇, 林润峰, 彭追日, 徐浪浪, 叶镭. 石墨烯摩尔超晶格的近场纳米成像（特邀） . 红外与激光工程, 2022, 51(7): 20211118-1-20211118-3. doi: 10.3788/IRLA20211118
[3]	刘全喜, 任钢, 李轶国, 岳通, 王莉, 肖星, 邓翠, 李佳玲. 激光二极管端面抽运梯度浓度掺杂介质激光器热效应的有限元法分析 . 红外与激光工程, 2019, 48(11): 1105004-1105004(11). doi: 10.3788/IRLA201948.1105004
[4]	解格飒, 王红军, 王大森, 田爱玲, 刘丙才, 朱学亮, 刘卫国. 超光滑表面缺陷的分类检测研究 . 红外与激光工程, 2019, 48(11): 1113003-1113003(7). doi: 10.3788/IRLA201948.1113003
[5]	姬一鸣, 庄茂录, 张贵新, 陈爱萍, 王丽, 李文强. 有限探测死时间的高速测量设备无关-量子密钥分配 . 红外与激光工程, 2018, 47(S1): 55-59. doi: 10.3788/IRLA201847.S122001
[6]	金涛, 谢孟宇, 冀胡东, 吴丹丹, 郑继红. 扫描近场圆偏振光学显微镜 . 红外与激光工程, 2017, 46(11): 1103003-1103003(5). doi: 10.3788/IRLA201746.1103003
[7]	王明利, 朱艳英, 魏勇, 张乐. 米状银纳米颗粒对局域电场增强的理论模拟 . 红外与激光工程, 2017, 46(2): 216001-0216001(7). doi: 10.3788/IRLA201746.0216001
[8]	Sekou Singare, 陈盛贵, 钟欢欢. 激光透射焊接聚碳酸酯的有限元分析 . 红外与激光工程, 2016, 45(2): 206005-0206005(6). doi: 10.3788/IRLA201645.0206005
[9]	张耀平, 樊峻棋, 龙国云. 变形镜在激光辐照下热畸变有限元模拟 . 红外与激光工程, 2016, 45(11): 1136002-1136002(5). doi: 10.3788/IRLA201645.1136002
[10]	肖冬明, 何宽芳, 王迪. 基于多层有限元模型的激光选区熔化多层瞬态温度场演化规律研究 . 红外与激光工程, 2015, 44(9): 2672-2678.
[11]	闫树斌, 赵宇, 杨德超, 李明慧, 张安富, 张文栋, 薛晨阳. 基于近场光学理论光镊的研究进展 . 红外与激光工程, 2015, 44(3): 1034-1041.
[12]	吴军, 王海伟, 郭颖, 洪光烈, 何志平, 徐卫明, 舒嵘. 资源有限FPGA的多通道时间-数字转换系统 . 红外与激光工程, 2015, 44(4): 1208-1217.
[13]	宋德, 朴雪, 拜晓锋, 刘春阳. 近贴型像增强器中微通道板输入端电场模拟研究 . 红外与激光工程, 2015, 44(10): 2981-2986.
[14]	许兆美, 汪通悦, 裴旭, 蒋素琴, 李伯奎, 王庆安, 洪宗海. Al₂O₃陶瓷激光多道铣削温度场有限元模拟 . 红外与激光工程, 2015, 44(2): 477-481.
[15]	夏祖学, 刘发林, 陈俊学, 尚丽平, 邓琥, 熊亮. 偶极子光电导天线结构对THz 辐射特性影响的研究 . 红外与激光工程, 2015, 44(8): 2429-2434.
[16]	杜渐, 费锦东. 红外成像光学系统近场辐射噪声建模与仿真分析 . 红外与激光工程, 2014, 43(1): 1-5.
[17]	王为清, 杨立, 范春利, 吕事桂, 石宏臣. Q235钢拉伸过程热塑性效应试验研究及有限元分析 . 红外与激光工程, 2013, 42(5): 1153-1160.
[18]	朱敏, 陈宇, 杨春玲. 红外诱饵弹干扰特性有限元建模 . 红外与激光工程, 2013, 42(8): 1979-1986.
[19]	李云, 段沽坪, 邢廷文. 光学元件面形误差的光滑延展算法 . 红外与激光工程, 2013, 42(2): 408-412.
[20]	马占龙, 王君林. 超高精度光学元件加工技术 . 红外与激光工程, 2013, 42(6): 1485-1490.

点击查看大图

计量

文章访问数: 399
HTML全文浏览量: 60
PDF下载量: 147
被引次数: 0

姓名
邮箱
手机号码
标题
留言内容
验证码

留言板

非绝热近场光学诱导平滑硅表面微结构的电场模拟

Simulation of electric field modulated by silicon-microstructure during non-adiabatic near-field optical etching process

计量

非绝热近场光学诱导平滑硅表面微结构的电场模拟

1. 先进微结构材料教育部重点实验室,上海200092;

2. 同济大学物理科学与工程学院精密光学工程技术研究所,上海200092;

3. 上海无线电设备研究所电磁散射国家重点实验室,上海200092

English Abstract

Simulation of electric field modulated by silicon-microstructure during non-adiabatic near-field optical etching process

全文HTML

目录

留言板

非绝热近场光学诱导平滑硅表面微结构的电场模拟

Simulation of electric field modulated by silicon-microstructure during non-adiabatic near-field optical etching process

计量

出版历程

非绝热近场光学诱导平滑硅表面微结构的电场模拟

1. 先进微结构材料教育部重点实验室,上海200092; 2. 同济大学物理科学与工程学院精密光学工程技术研究所,上海200092; 3. 上海无线电设备研究所电磁散射国家重点实验室,上海200092

English Abstract

Simulation of electric field modulated by silicon-microstructure during non-adiabatic near-field optical etching process

全文HTML

目录

1. 先进微结构材料教育部重点实验室,上海200092;

2. 同济大学物理科学与工程学院精密光学工程技术研究所,上海200092;

3. 上海无线电设备研究所电磁散射国家重点实验室,上海200092