超精密位移台计量特性的差动式平面镜干涉溯源分析

Traceable analysis of the performance of an ultra-fine positioning stage using a differential plane mirror interferometer

  • 摘要: 超精密纳米位移台常用于扫描探针显微镜、光学显微镜等高精度分析仪器中,其纳米机械性能的精密计量和校准对显微测量系统的性能起着关键作用。基于一种双通道结构差动式平面镜干涉测量与校准方法(英国国家物理实验室),文中对一种超精密位移台的关键计量特性进行了定量研究。构建了基于现场可编程门阵列(FPGA)和LabView的高精度稳频激光干涉数据采集和数据解码系统,使其可溯源超精密纳米位移台的准静态校准计量特性。进一步地,利用该干涉测量系统对超精密位移台的计量特性进行了校准和分析。测试结果显示,该激光干涉校准系统在准开放环境中的背景噪声低于10 \rmpm/\sqrt \rmHz ;该超精密位移台具有优良的纳米机械性能,其线性度低于1.2×10−4,分辨率达40 pm,重复性和稳定性较好。上述对校准设备准静态性能和对纳米位移台计量特性的测试结果表明,所提出的方法和系统能够对纳米位移台进行计量,从而用于小于几皮米的皮米级压痕测量以及原子尺度上的大范围测量。

     

    Abstract: Ultra-fine positioning stages are the indispensable components in many areas of nanotechnology and advanced material analysis, and are always integrated into analytical devices such as Scanning Probe Microscope (SPM), optical microscope. The mechanical properties of the microscopic measurement system were strongly influenced by the nano-mechanical performance of an ultra-fine positioning stage. A traceable calibration setup for investigating the quasi-static performance of nano-positioning stage was developed, which utilized a differential plane mirror interferometer with double-pass configuration from the National Physical Laboratory (NPL). Based on an NPL-developed FPGA and LabView, the laser interferometric data acquisition (DAQ) and data decoding system with high precision and stable frequency was built up to enable traceable quasi-static calibration of ultra-fine nano positioning stages. Furtherly, the proposed system was used to calibrate and analyze the metrological characteristics of nano-positioning stages. The experimental results have proven that the calibration setup can achieve a noise floor lower than 10 \rmpm/\sqrt \rmHz under nearly open-air conditions. The calibrated pico-positioning stage has an excellent nano-mechanical performances, such as the linearity of being lower than 1.2×10−6, the resolution of being up to 40 picometer, good repeatability and stabilization. The results indicate that the proposed method and system can be used to measure the performances of the ultra-fine positioning stages, and furtherly be used for pico-indentation with indentation depths down to a few picometers and the large-scope measurement at the atomic scale.

     

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