Zhang Wentao, Zhu Baohua, Wang Jiejun, Zhang Baowu, Xiong Xianming. Effects of divergence angle on deposition of neutral atoms[J]. Infrared and Laser Engineering, 2016, 45(3): 306003-0306003(5). doi: 10.3788/IRLA201645.0306003
Citation:
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Zhang Wentao, Zhu Baohua, Wang Jiejun, Zhang Baowu, Xiong Xianming. Effects of divergence angle on deposition of neutral atoms[J]. Infrared and Laser Engineering, 2016, 45(3): 306003-0306003(5). doi: 10.3788/IRLA201645.0306003
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Effects of divergence angle on deposition of neutral atoms
- 1.
Department of Electrical Engineering and Automation,Guilin University of Electronic Technology,Guilin 541004,China;
- 2.
Key Laboratory of Optoelectronic Information Processing,Guangxi Colleges and Universities,Guilin 541004,China;
- 3.
College of Metrology & Measurement Engineering,China Jiliang Universtiy,Hangzhou 310000,China
- Received Date: 2015-07-06
- Rev Recd Date:
2015-08-10
- Publish Date:
2016-03-25
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Abstract
Using neutral chromium atoms for the fabrication of nanometer-scale ordered structures is a new method of generating nanostructures on a substrate. But all the information of nano-gratings deposited by laser standing wave field can not be given only through one-dimensional or two-dimensional analysis. Three-dimensional analysis of the effects of atomic beam divergence angle on the process of fabricating nano-grating was discussed based on the three-dimensional motion model of Cr atoms in Gaussian standing wave laser field. The study shows that the preparation of a high-collimated and transversely cooled atomic beam, typically under 0.6 mrad, is essential to minimize the severely disadvantageous effects for deposition of atoms in laser standing wave.
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Proportional views
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