Volume 49 Issue S1
Sep.  2020
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Li Qiantao, Li Ding, Wang Chan, Xiong Changxin, Yang Changcheng. Study on stability of Ta2O5/Al2O3 laser gyro mirrors exposed in plasma[J]. Infrared and Laser Engineering, 2020, 49(S1): 20200064. doi: 10.3788/IRLA20200064
Citation: Li Qiantao, Li Ding, Wang Chan, Xiong Changxin, Yang Changcheng. Study on stability of Ta2O5/Al2O3 laser gyro mirrors exposed in plasma[J]. Infrared and Laser Engineering, 2020, 49(S1): 20200064. doi: 10.3788/IRLA20200064

Study on stability of Ta2O5/Al2O3 laser gyro mirrors exposed in plasma

doi: 10.3788/IRLA20200064
  • Received Date: 2020-04-01
  • Rev Recd Date: 2020-05-09
  • Publish Date: 2020-09-22
  • Ta2O5/Al2O3 laser gyro mirrors have been exposed in oxygen, air, argon and neon plasma respectively. Plasma was generated by capacity coupling Radio Frequency(RF) discharge technology. The effect of plasma pressure, plasma exposing time and plasma type on optical loss of Ta2O5/Al2O3 laser gyro mirrors was studied. The phenomenon and mechanism, for the optical loss change of Ta2O5/Al2O3 laser gyro mirrors was analyzed and discussed, by using comparing experiments, Energy Disperse Spectroscopy(EDS) and X-ray photo-electron spectroscopy(XPS). Ta2O5/Al2O3 laser gyro mirrors exposed in oxygen showed biggest total loss, which arrived 15 ppm(1 ppm=1×10-6). The value was 2 to 4 times of Ta2O5/Al2O3 laser gyro mirrors exposing in air, Ne and Ar plasma. The total loss changing was caused by the absorption of outermost 2LAl2O3 layer in Ta2O5/Al2O3 laser gyro mirrors. When Ta2O5/Al2O3 laser gyro mirrors exposing O2 plasma and Ar plasma alternately, the partial reversible changing phenomenon of 2LAl2O3 layer's absorption loss was found. The partial reversible changing phenomenon was discussed by XPS analyzing. The results show that the absorption loss changing is related to the exchanging of free oxygen and argon, occurred between outermost 2LAl2O3 layer and plasma. Some measures and suggestions are proposed to improve the stability of Ta2O5/Al2O3 laser gyro mirrors exposed in plasma.
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    [2] Cole, B E. UV and plasma stable high-reflectance multilayer dielectric mirror:EP, 0372438A2[P]. 1989.
    [3] Wang Peng. Theoretical investigation of the loss of high-reflection films[D]. Chengdu:University of Electronic Science and Technology of China, 2015. (in Chinese)王鹏. 高反射膜损耗的理论研究[D]. 成都:电子科技大学, 2015.
    [4] Hyun Ju Cho, Young Zip Jeon. Design and fabrication of super mirrors on the Zerodur substrate[C]//Proc of SPIE, 2010, 7786:778611.
    [5] Lu S, Sun M J, Stewart A F, et al. Ultraviolet resistive coated mirror and method of fabrication:US, 5513039[P]. 1996.
    [6] Ji Yiqin, Liu Huasong. Silicon Dioxide Optical Thin Film Material[M]. Beijing:National Defence Industry Press,2018. (in Chinese)季一勤, 刘华松. 二氧化硅光学薄膜材料[M]. 北京:国防工业出版, 2018.
    [7] Robertson J. Diamond-like amorphous carbon[J]. Mater Sci and Eng R, 2002, 37:129-281.
    [8] Gutierrez G, Taga A, Johansson B, et al. Theoretical structure determination of γ-Al2O3[J]. Physical Review B, 2002, 65:201-204.
    [9] Thielsch R, Gatto A, Heber J, et al. A comparative study of the UV optical and structural prperties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion beam[J]. Thin Solid Films, 2002, 410(1-2):86-93.
    [10] Nakamnra R, Ishimaru M, Yasuda H. Automic rearrangements in amorphous Al2O3 under electron-beam irradiation[J]. Journal of Applied Physics, 2013, 113(6):064312.
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    [12] Liu Yanhong, Zhao Yu, Wang Meitian, et al. Two modes of devices damage during plasma processing[J]. Semiconductor Technology, 2002, 27(5):69-70. (in Chinese)刘艳红, 赵宇, 王美田, 等. 等离子体加工对器件损伤的两种模式[J]. 半导体技术, 2002, 27(5):69-70.
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Study on stability of Ta2O5/Al2O3 laser gyro mirrors exposed in plasma

doi: 10.3788/IRLA20200064
  • Huazhong Institute of Electro-Optics-Wuhan National Laboratory for Optoelectronics, Wuhan 430223, China

Abstract: Ta2O5/Al2O3 laser gyro mirrors have been exposed in oxygen, air, argon and neon plasma respectively. Plasma was generated by capacity coupling Radio Frequency(RF) discharge technology. The effect of plasma pressure, plasma exposing time and plasma type on optical loss of Ta2O5/Al2O3 laser gyro mirrors was studied. The phenomenon and mechanism, for the optical loss change of Ta2O5/Al2O3 laser gyro mirrors was analyzed and discussed, by using comparing experiments, Energy Disperse Spectroscopy(EDS) and X-ray photo-electron spectroscopy(XPS). Ta2O5/Al2O3 laser gyro mirrors exposed in oxygen showed biggest total loss, which arrived 15 ppm(1 ppm=1×10-6). The value was 2 to 4 times of Ta2O5/Al2O3 laser gyro mirrors exposing in air, Ne and Ar plasma. The total loss changing was caused by the absorption of outermost 2LAl2O3 layer in Ta2O5/Al2O3 laser gyro mirrors. When Ta2O5/Al2O3 laser gyro mirrors exposing O2 plasma and Ar plasma alternately, the partial reversible changing phenomenon of 2LAl2O3 layer's absorption loss was found. The partial reversible changing phenomenon was discussed by XPS analyzing. The results show that the absorption loss changing is related to the exchanging of free oxygen and argon, occurred between outermost 2LAl2O3 layer and plasma. Some measures and suggestions are proposed to improve the stability of Ta2O5/Al2O3 laser gyro mirrors exposed in plasma.

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