Zhang Mingkai, Gao Sitian, Lu Rongsheng, Li Wei, Li Qi, Qian Xiaoli. Ultraviolet scanning linewidth measuring system[J]. Infrared and Laser Engineering, 2015, 44(2): 625-631.
| Citation:
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Zhang Mingkai, Gao Sitian, Lu Rongsheng, Li Wei, Li Qi, Qian Xiaoli. Ultraviolet scanning linewidth measuring system[J]. Infrared and Laser Engineering, 2015, 44(2): 625-631.
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Ultraviolet scanning linewidth measuring system
- 1.
School of Instrument Science and Opto-electronics Engineering,Hefei University of Technology,Hefei 230009,China;
- 2.
National Institute of Metrology,Beijing 100013,China;
- 3.
College of Mechanical Engineering,ZheJiang University of Technology,Hangzhou 310014,China
- Received Date: 2014-06-14
- Rev Recd Date:
2014-07-17
- Publish Date:
2015-02-25
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Abstract
An ultraviolet imaging system was designed for quantitative characterization of micro-and nanostructures. A beam splitter inserted in the detection path reflected the signal from sample to a pinhole on the imaging plane. The sample was scanned to obtain the sample profile. The DUV light from apparatus was utilized to reduce the diffraction limit size and enhance resolution; and laser interferometer was used to trace the line width to international SI unit. CCD image was used to auto-focus the sample. Sequence images were captured along axial direction and the focus sharpness was determined by focus evaluation function. Algorithms were compared and wavelet algorithm for critical dimension auto-focused in used the ultraviolet measurement system. For wavelet, decomposition level, wavelet vanishing moments and other parameters for UV imaging system was determined.
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