张禹, 杨忠明, 刘兆军, 王继红. 大口径多光谱通道波前测量系统设计[J]. 红外与激光工程, 2020, 49(8): 20190559. DOI: 10.3788/IRLA20190559
引用本文: 张禹, 杨忠明, 刘兆军, 王继红. 大口径多光谱通道波前测量系统设计[J]. 红外与激光工程, 2020, 49(8): 20190559. DOI: 10.3788/IRLA20190559
Zhang Yu, Yang Zhongming, Liu Zhaojun, Wang Jihong. Design of large aperture multi-spectra channel wavefront measurement system[J]. Infrared and Laser Engineering, 2020, 49(8): 20190559. DOI: 10.3788/IRLA20190559
Citation: Zhang Yu, Yang Zhongming, Liu Zhaojun, Wang Jihong. Design of large aperture multi-spectra channel wavefront measurement system[J]. Infrared and Laser Engineering, 2020, 49(8): 20190559. DOI: 10.3788/IRLA20190559

大口径多光谱通道波前测量系统设计

Design of large aperture multi-spectra channel wavefront measurement system

  • 摘要: 随着波前测量技术的发展,具有多光谱通道的大口径波前测量系统成为波前测量领域的研究热点。设计了一种大口径多光谱通道波前测量系统,主要由前置RC缩束系统、调光组件、分光组件和波前传感器等组成,有效口径为450 mm,工作波段为0.5~0.8 μm、0.9~1.7 μm和3~5 μm。给出了光学系统的设计参数,描述了系统中光学元件的参数选择,运用Zemax软件完成了光学系统的建模和仿真。进行了机械系统的方案设计,并完成了系统的光机热集成分析。测试了大口径多光谱通道波前测量系统的各项参数,结果表明该波前测量系统的有效口径大于450 mm,在−10~50 ℃工作环境下,对可见光、近红外、中红外波段的波前均可实现高精度实时稳定测量,系统的波前测量稳定性优于0.05λ(RMS,λ=532 nm)。

     

    Abstract: With the development of wavefront measurement technology, the large aperture and multi-spectra channel wavefront measurement system had become a research hotspot in the field of wavefront measurement. The large aperture and multi-spectra channel wavefront measurement system was mainly composed of fore RC shrink-beam system, dimming component, beam splitters and wavefront sensors.The system with an effective aperture of 450 mm had working wavelengths of 0.5−0.8 μm, 0.9−1.7 μm and 3−5 μm. The design parameters of the optical system were given, the selection of optical element parameters in the system was described. The modeling and simulation of the optical system were completed by Zemax. The design scheme of the mechanical system was finished, and integrated optical-mechanical-thermal analysis of the system were completed. The parameters of the large aperture and multi-spectra channel wavefront measurement system are tested, the results show that the effective aperture of the wavefront measurement system is larger than 450 mm, at the environment of −10-50 ℃, the system can measure wavefronts in the visible, near-infrared, and mid-infrared bands with high precision and stability, the stability of the wavefront measurement system is better than 0.05λ (RMS, λ=532 nm).

     

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