冯秦旭, 齐润泽, 李文斌, 倪航剑, 黄秋实, 张众, 王占山. 涂硼中子探测器用B4C薄膜的应力和粘附力研究[J]. 红外与激光工程, 2019, 48(S2): 68-74. DOI: 10.3788/IRLA201948.S217001
引用本文: 冯秦旭, 齐润泽, 李文斌, 倪航剑, 黄秋实, 张众, 王占山. 涂硼中子探测器用B4C薄膜的应力和粘附力研究[J]. 红外与激光工程, 2019, 48(S2): 68-74. DOI: 10.3788/IRLA201948.S217001
Feng Qinxu, Qi Runze, Li Wenbin, Ni Hangjian, Huang Qiushi, Zhang Zhong, Wang Zhanshan. Stress and adhesion of B4C films for boron-coated neutron detectors[J]. Infrared and Laser Engineering, 2019, 48(S2): 68-74. DOI: 10.3788/IRLA201948.S217001
Citation: Feng Qinxu, Qi Runze, Li Wenbin, Ni Hangjian, Huang Qiushi, Zhang Zhong, Wang Zhanshan. Stress and adhesion of B4C films for boron-coated neutron detectors[J]. Infrared and Laser Engineering, 2019, 48(S2): 68-74. DOI: 10.3788/IRLA201948.S217001

涂硼中子探测器用B4C薄膜的应力和粘附力研究

Stress and adhesion of B4C films for boron-coated neutron detectors

  • 摘要: 涂硼中子探测器作为3He中子探测器的替代技术,已经成为了当今研究的焦点。对于涂硼中子探测器而言,B4C薄膜的应力需要减小,与铝基底间的粘附力需要增大。为了增大B4C薄膜与铝基底间的粘附力,该实验使用直流磁控溅射技术在不使用基底加热的前提下制备应力较小的B4C薄膜,同时在铝基底和B4C薄膜之间添加Mg-Al合金层。该实验主要研究了沉积过程中溅射气压对B4C薄膜应力的影响,以及Mg-Al合金层及其溅射气压和厚度对B4C薄膜粘附力的影响。实验结束后采用扫描电镜和透射电镜对薄膜的微观结构进行了表征和分析。实验结果表明,当沉积过程中溅射气压增大时,B4C薄膜的应力减小并趋于稳定。超薄多孔的Mg-Al合金层与B4C、Al2O3有着明显的反应,能够在不使用基底加热的前提下有效地增大B4C薄膜与铝基底间的粘附力。

     

    Abstract: As an alternative to 3He neutron detectors, boron-coated neutron detectors have been a current focus for researchers worldwide. For the boron-coated neutron detectors, a B4C film with low stress and good adhesion to the Al substrate is required. To enhance adhesion of the B4C films on Al substrates, a B4C film with low stress was fabricated by direct current sputtering technique without substrate-heating. The Mg-Al alloy thin film was introduced between the B4C film and its substrate for enhancing the adhesion. The effect of sputtering pressure on the stress of B4C films during deposition was studied. Additionally, the adhesion of B4C films using Mg-Al films as adhesive layers and effects of sputtering pressure and alloy film thickness on adhesion were studied. Scanning and transmission electron microscopies were used to characterize the microstructure. Experimental results show that the stress of B4C films decreases and stabilizes when sputtering pressure increases during deposition. Thin and porous Mg-Al films react well with both B4C films and Al2O3 on Al substrates to enhance adhesion of the B4C films, without substrate-heating.

     

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