郎天宇, 王海珠, 于海鑫, 王登魁, 马晓辉. Zn、Si掺杂GaAs纳米线的发光性能[J]. 红外与激光工程, 2024, 53(7): 20240153. DOI: 10.3788/IRLA20240153
引用本文: 郎天宇, 王海珠, 于海鑫, 王登魁, 马晓辉. Zn、Si掺杂GaAs纳米线的发光性能[J]. 红外与激光工程, 2024, 53(7): 20240153. DOI: 10.3788/IRLA20240153
LANG Tianyu, WANG Haizhu, YU Haixin, WANG Dengkui, MA Xiaohui. Optical performance of Zn, Si doped GaAs nanowires[J]. Infrared and Laser Engineering, 2024, 53(7): 20240153. DOI: 10.3788/IRLA20240153
Citation: LANG Tianyu, WANG Haizhu, YU Haixin, WANG Dengkui, MA Xiaohui. Optical performance of Zn, Si doped GaAs nanowires[J]. Infrared and Laser Engineering, 2024, 53(7): 20240153. DOI: 10.3788/IRLA20240153

Zn、Si掺杂GaAs纳米线的发光性能

Optical performance of Zn, Si doped GaAs nanowires

  • 摘要: 为探明掺杂对硅基GaAs纳米线发光性能的影响机理,采用金属有机物化学气相沉积(MOCVD)技术,以气-液-固(VLS)生长机制为基础,在硅基上实现了Zn和Si掺杂的GaAs纳米线制备。通过变温、变功率光致发光(PL)等表征手段发现,未掺杂与Si掺杂GaAs纳米线具有更优异的发光质量,带隙随温度的变化规律符合Varshni公式,发光来源为自由激子复合(α>1)。而Zn掺杂纳米线的发光峰出现极大展宽,发光来源为缺陷或杂质相关跃迁(α<1),峰位随激发功率的变化规律与P1/3成正比。结合透射电子显微镜(TEM)测试结果进一步表明,Zn掺杂纳米线中出现了纤锌矿/闪锌矿(WZ/ZB)混合结构,是导致GaAs纳米线发光质量变差的主要原因。

     

    Abstract:
    Objective Nanowires (NWs), being one-dimensional (1D) semiconductor materials, hold considerable value due to their distinctive properties in various nanoscale optoelectronic devices. Silicon based optoelectronic technology has high compatibility with microelectronic processes, and the research and development of heteroepitaxial III-V group compounds on silicon are rapidly advancing, enabling the fabrication of silicon photonic chips. Considering the application of doped nanowires in p-n junctions and optoelectronic integrated devices, as well as the rapid development of the micro-optoelectronic industry, the research on Si based doped GaAs nanowires is of great significance. Under the influence of the tide to combine the III-V group compounds with silicon, Zn, Si doped GaAs NWs have been successfully grown on Si/SiO2 substrates using MOCVD technology. In order to explore the Zn, Si doping effects on the optical performance of GaAs NWs, variable temperature and power density photoluminescence (PL) measurement have been conducted on each sample. This manuscript will provide technical reserves and theoretical support for the further research and development of GaAs nanowires.
    Methods Zn, Si doped and undoped GaAs NWs have been grown via MOCVD technology under some growth conditions. The only distinguishment between three grown samples are the addition of two different dopants, which are SiH4 and DEZn. The growth morphology of three samples were detected through SEM measurement (Fig.1) in order to verify the successful growth of nanowires. The optical performance of Zn, Si doped nanowires was contrasted through low temperature PL spectrum (Fig.2). The luminescence origins of each sample were distinguished through 15 K variable power density PL tests (Fig.3). Subsequently, variable temperature PL tests were performed on each sample to verify the degree of fitting between peak position altering pattern with temperature and theoretical values (Fig.4). In the end, necessary TEM measurement was conducted on Zn doped sample to explore its structure characteristics.
    Results and Discussions The growth morphology of three samples were detected through SEM measurement. The nanowires were grown via VLS growth mechanism on silicon substrates and the growth direction is random and chaotic (Fig.1). The optical performance of Zn, Si doped nanowires was contrasted through low temperature PL spectrum (Fig.2). The luminescence peak of Zn doped NWs was broaden compared to another samples. The luminescence origin of Zn, Si doped nanowires was investigated through variable temperature and power density PL tests (Fig.3-4). It was found out that, the optical performance of undoped and Si-doped nanowires is better seeing the luminescence origin is free exciton recombination (α>1). However, the luminescence origin of Zn-doped nanowires is defect or impurity related transitions seeing its characteristic value α < 1. Besides, its peak position is directly proportional to P1/3, indicating the WZ/ZB II type luminescence. Combining with the TEM results, it can be further verified that, Zn-doped nanowires exhibited WZ/ZB mixed structure, which was the main cause of its larger full width at half maxima.
    Conclusions This article used MOCVD technology and VLS growth mechanism to achieve epitaxial growth of silicon-based doped GaAs nanowires. Through SEM measurements, the nanowires were grown using the VLS growth mechanism and the growth direction is relatively disorderly. Through variable temperature and power density PL tests, it was found that the luminescence origin was free exciton recombination. The luminescence origin of Zn doped nanowires was defect or impurity related transitions along with the appearance of WZ/ZB II type luminescence. Based on TEM results, it can be concluded that due to the influence of Zn element, WZ/ZB mixed structure appear in Zn doped GaAs nanowires which complicated the luminescence mechanism of GaAs nanowires and added another radiation recombination. The appearance of WZ/ZB mixed structure caused the broadening of the low-temperature PL peak of Zn doped GaAs nanowires. The luminescence and structural properties of silicon-based doped GaAs nanowires was regulated by changing the doping source.

     

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