Abstract: Alkali vapor cell is one of the key components of chip-scale atomic clocks (CSACs), and its microfabrication is very significant yet challenging. Arrays of 87Rb vapor cell with dual-chamber for CSACs were batch fabricated by MEMS technology. Pure 87Rb vapor was produced by in-situ chemical reaction during anodic bonding process and buffer gas (N2) was backfilled to ensure the pressure is precisely controlled. The dual-chamber structure helps to prevent the impurity after reaction from blocking light path, in order to improve the intensity of optical signal. Optical absorption spectrum of 87Rb D1 line and the error signal used to lock the frequency of chip-scale atomic clock were finally obtained through experimental test. The peak-to-valley separation of the 87Rb D1 line error signal can reach 0.53 kHz at 90℃, which indicates that the 87Rb vapor cell can meet the requirement of CSACs or other chip-scale atomic devices (CSADs).