MEMS F-P interferometry pressure sensor
-
摘要: 为了满足工业、航天、国防等领域对微型化压力传感器的需求，提出了基于微机电系统（MEMS，Micro electromechanical System）技术制作的非本征型光纤法布里-珀罗（F-P）压力传感器，该传感器传感头由全玻璃材料构成。主要研究了MEMS 技术制作全玻璃结构式压力传感器工艺，结合溅射、光刻、腐蚀等工艺在7 740 wafer 基底上制作出F-P 腔体，利用低压化学气相沉积（LPCVD）的方法在基底上沉积一层40 nm 的非晶硅作为中间层。通过阳极键合技术在温度400℃下完成玻璃与玻璃的键合，并搭建了该传感器的压力测量平台。实验结果表明：在压力线性范围0~400 kPa 内传感器具有很高的重复性，达到0.3%。灵敏度达到1.764 nm/kPa；在传感器使用范围0~80℃内，热敏感系数为 0.15 nm/℃。该传感器的研究对设计制作改善了该类传感器的热膨胀失配问题，对低温漂型压力传感器的研究有一定参考价值。Abstract: In order to meet the requirements of industry, aerospace and defense for miniature pressure sensors, an optical F-P interferometry pressure sensor which was made from all-glass material was presented, the sensor head of which was made from all-glass material. The processing steps of MEMS craft for fabrication of the all-glass optical pressure sensor were studied mainly, F-P cavity was made on 7 740 wafer based on sputtering, photolithography and etching technology, a 40 nm thick amorphous silicon layer deposited by low-pressure chemical vapor deposition (LPCVD) on this wafer was used as an intermediate layer. Then glass-to-glass anodic bonding was finished under the temperature of 380. Finally, the pressure measurement system was established. The experiment result shows that a high repeatability in the range of 0-400 kPa pressure and a reasonable sensitivity of 1.764 nm/kPa have been obtained in this pressure sensor. The temperature-sensitivity coefficient of the sensor was about 0.15 nm/℃ in the range of 0-80℃. The study of the pressure sensor would be of utility value for design and fabrication of low temperature drift typed pressure sensor.
-
Key words:
- optical sensor /
- MEMS /
- all-glass material /
- fabrication of F-P cavity
-
[1] Jiang Y. Advanced Optical Fiber Sensing Technology [M]. Beijing: Science Press, 2009: 147-169. (in Chinese) [2] [3] [4] Liao Y B, Li M, Yan C S. Modern Optical Information Sensing Principle [M]. Beijing: Tsinghua Science and Technology Press, 2009: 201-208. (in Chinese) [5] Lee C E, Taylor H F, Markus A M, et al. Optical-fiber Fabry-Perot embedded sensor[J]. Optics Letters, 1989, 14(21): 1225-1227. [6] [7] [8] San H S, Song Z J, Wang X, et al. Piezoresistive pressure sensors for harsh environments [J]. Optics and Precision Engineering, 2012, 20(3): 550-555. (in Chinese) [9] [10] Jia C Y. Study on miniature low pressure Fabry-Perot interferometric fiber optic sensor[D]. Dalian: Dalian Uiversity of Technology, 2009. (in Chinese) [11] [12] Chen Chinhsing, Chen Minchih, Liu Wenfung. Electrical power sensor based on fiber Bragg grating and piezo-electric transducer [J]. Optics and Precision Engineering, 2011, 19(9): 2255. (in Chinese) [13] Xiao S R, Zhu P, Ben F L. Analysis on characteristics of optical fiber sensor for atmospheric pressure [J]. Optics and Precision Engineering, 2008, 16(6): 1042-1047. (in Chinese) [14] [15] [16] Li M, Wang M, Li H. Optical MEMS pressure sensor based on Fabry-Perot interferometry [ J ] . Optics Express, 2006, 14 (4): 1497-1504. (in Chinese) [17] Franssila S. Introduction to Microfabrication [M]. US: Wiley, 2010: 230-246. [18] [19] [20] Zhang Z P. Optical Fiber Sensor Principle [M]. Beijing: China Metrology Press, 1991: 1304-1308. (in Chinese) [21] Jiang Y, Tang C J. Principles and Applications of Optical Fiber Fabry-Perot Interferometer[M]. Beijing: National Defence Industry Press, 2009: 1803-1807. (in Chinese) [22] [23] [24] Iliescu C, Miao J, Tay F E H. Stress control in masking layers for deep wet micromachining of Pyrex glass [J]. Sensors and Actuators A: Physical, 2005, 117(2): 286-292. [25] [26] Kutchoukov V G, Laugere F, Van Der Vlist W, et al. Fabrication of nanofluidic devices using glass-to-glass anodic bonding [ J ] . Sensors and Actuators A: Physical, 2004, 114 (2): 521-527. [27] Berthold A, Nicola L, Sarro PM, et al. Glass-to-glass anodic bonding with standard IC technology thin films as intermediate layers [J]. Sensors and Actuators A: Physical, 2000, 82(1): 224-228. [28] [29] Zheng Z X, Lin Y F, Fen Y J. Research of 7740 Glass wet etching grooves and slot lithography graphic [J]. Journal of Xiamen University: JCR Science Edition, 2005, 44 (3): 370-372. (in Chinese) [30] [31] Iliescu C, Jing J, Tay F E H, et al. Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution [J]. Surface and Coatings Technology, 2005, 198(1): 314-318. -
点击查看大图
计量
- 文章访问数: 325
- HTML全文浏览量: 48
- PDF下载量: 258
- 被引次数: 0
下载:
