Si间隔层对Al(1wt.%Si)/Zr极紫外多层膜热稳定的作用研究

李嘉; 朱杰; 张众; 齐润泽; 钟奇; 王占山

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Si间隔层对Al(1wt.%Si)/Zr极紫外多层膜热稳定的作用研究

李嘉, 朱杰, 张众, 齐润泽, 钟奇, 王占山

文章导航 > 红外与激光工程 > 2015 > 44(4): 1335-1342

李嘉, 朱杰, 张众, 齐润泽, 钟奇, 王占山. Si间隔层对Al(1wt.%Si)/Zr极紫外多层膜热稳定的作用研究[J]. 红外与激光工程, 2015, 44(4): 1335-1342.

引用本文:

李嘉, 朱杰, 张众, 齐润泽, 钟奇, 王占山. Si间隔层对Al(1wt.%Si)/Zr极紫外多层膜热稳定的作用研究[J]. 红外与激光工程, 2015, 44(4): 1335-1342.

Li Jia, Zhu Jie, Zhang Zhong, Qi Runze, Zhong Qi, Wang Zhanshan. Effect of Si barrier layers on the thermal stability of Al(1 wt.%Si)/Zr multilayers designed as EUV mirrors[J]. Infrared and Laser Engineering, 2015, 44(4): 1335-1342.

Citation:

Li Jia, Zhu Jie, Zhang Zhong, Qi Runze, Zhong Qi, Wang Zhanshan. Effect of Si barrier layers on the thermal stability of Al(1 wt.%Si)/Zr multilayers designed as EUV mirrors[J]. Infrared and Laser Engineering, 2015, 44(4): 1335-1342.

Si间隔层对Al(1wt.%Si)/Zr极紫外多层膜热稳定的作用研究

1.
同济大学物理科学与工程学院精密光学工程技术研究所先进微结构材料教育部重点实验室,上海 200092

基金项目:

国家自然科学基金委员会与中国工程物理研究院联合基金资助(U1430131);上海市科委纳米项目(11nm0507200)

详细信息

作者简介:
李嘉(1988-),女,硕士生,主要从事X射线多层膜光学方面的研究.Email:freya.lijia@foxmail.com

中图分类号: O434.1

Effect of Si barrier layers on the thermal stability of Al(1 wt.%Si)/Zr multilayers designed as EUV mirrors

1.
MOE Key Laboratory of Advanced Micro-Structured Materials,Institute of Precision Optical Engineering,School of Physics Science and Engineering,Tongji University,Shanghai 200092,China

摘要: 为了提升Al/Zr多层膜的热稳定性,采用直流磁控溅射方法制备了18个带有不同厚度Si间隔层的Al(1 wt.%Si)/Zr多层膜,并将这些样品分别进行了不同温度(100~500 ℃)的真空退火,退火时间为1 h.利用X射线掠入射反射(GIXR)和X射线衍射(XRD)的方法来研究Si间隔层对Al/Zr多层膜热稳定性的作用.GIXR测量结果表明：随着Si间隔层厚度的增大,Al膜层的粗糙度减小,而Zr膜层的粗糙度增大;XRD测量结果表明：Al和Zr膜层粗糙度的变化是由于退火后膜层中晶粒尺寸不同造成的.相比于没有Si间隔层的Al/Zr多层膜,引入厚度为0.6 nm的Si间隔层可以有效提升Al/Zr多层膜的热稳定性.
- Al/Zr多层膜 /
- 热稳定性 /
- Si间隔层 /
- 合金界面层模型
Abstract: To improve the thermal stability of Al/Zr multilayers, eighteen Al(1 wt.%Si)/Zr multilayers with different thickness(0.4 nm, 0.6 nm and 0.8 nm) of Si barrier layers were prepared by using the direct-current magnetron sputtering system. All the multilayers were annealed from 100 ℃ to 500 ℃ in a vacuum furnace for 1 h. To evaluate the effect of Si barrier layers on the thermal stability of Al/Zr system, the multilayers were characterized by grazing incidence X-ray reflectance(GIXR) and X-ray diffraction (XRD). From the alloy-interlayer model in the GIXR, the roughness of Al layer decreases with increasing thickness of Si barrier layers, while the roughness of Zr layer increases. Based on the XRD, the changing trends of crystal sizes of Al and Zr can explain the results in the GIXR. Comparing with the multilayers without Si barrier layers in the annealing process, the sample with Si barrier layer(0.6 nm) have better structural performance, of which the multilayers could have a stable structural performance above 300 ℃.
- Al/Zr multilayers /
- thermal stability /
- Si barrier layer /
- alloy-interlayer model

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Si间隔层对Al(1wt.%Si)/Zr极紫外多层膜热稳定的作用研究

1. 同济大学物理科学与工程学院精密光学工程技术研究所先进微结构材料教育部重点实验室,上海 200092

作者简介:
李嘉(1988-),女,硕士生,主要从事X射线多层膜光学方面的研究.Email:freya.lijia@foxmail.com

收稿日期: 2014-08-11
修回日期: 2014-09-15
刊出日期: 2015-04-25

基金项目:

国家自然科学基金委员会与中国工程物理研究院联合基金资助(U1430131);上海市科委纳米项目(11nm0507200)

中图分类号: O434.1

关键词:

摘要: 为了提升Al/Zr多层膜的热稳定性,采用直流磁控溅射方法制备了18个带有不同厚度Si间隔层的Al(1 wt.%Si)/Zr多层膜,并将这些样品分别进行了不同温度(100~500 ℃)的真空退火,退火时间为1 h.利用X射线掠入射反射(GIXR)和X射线衍射(XRD)的方法来研究Si间隔层对Al/Zr多层膜热稳定性的作用.GIXR测量结果表明：随着Si间隔层厚度的增大,Al膜层的粗糙度减小,而Zr膜层的粗糙度增大;XRD测量结果表明：Al和Zr膜层粗糙度的变化是由于退火后膜层中晶粒尺寸不同造成的.相比于没有Si间隔层的Al/Zr多层膜,引入厚度为0.6 nm的Si间隔层可以有效提升Al/Zr多层膜的热稳定性.

English Abstract

Effect of Si barrier layers on the thermal stability of Al(1 wt.%Si)/Zr multilayers designed as EUV mirrors

1. MOE Key Laboratory of Advanced Micro-Structured Materials,Institute of Precision Optical Engineering,School of Physics Science and Engineering,Tongji University,Shanghai 200092,China

Received Date: 2014-08-11
Rev Recd Date: 2014-09-15
Publish Date: 2015-04-25

Keywords:

Abstract: To improve the thermal stability of Al/Zr multilayers, eighteen Al(1 wt.%Si)/Zr multilayers with different thickness(0.4 nm, 0.6 nm and 0.8 nm) of Si barrier layers were prepared by using the direct-current magnetron sputtering system. All the multilayers were annealed from 100 ℃ to 500 ℃ in a vacuum furnace for 1 h. To evaluate the effect of Si barrier layers on the thermal stability of Al/Zr system, the multilayers were characterized by grazing incidence X-ray reflectance(GIXR) and X-ray diffraction (XRD). From the alloy-interlayer model in the GIXR, the roughness of Al layer decreases with increasing thickness of Si barrier layers, while the roughness of Zr layer increases. Based on the XRD, the changing trends of crystal sizes of Al and Zr can explain the results in the GIXR. Comparing with the multilayers without Si barrier layers in the annealing process, the sample with Si barrier layer(0.6 nm) have better structural performance, of which the multilayers could have a stable structural performance above 300 ℃.