利用原子淀积Al<sub>2</sub>O<sub>3</sub>对InP光学稳定性的研究

利用原子淀积Al₂O₃对InP光学稳定性的研究

摘要: 提出一种钝化InP表面的新方法湿法钝化和干法钝化相结合。这种新型的钝化方式有效地降低了InP表面态密度，并使其表面暴露在空气中一段时间后仍具有较好的稳定性。实验利用光致发光（PL）谱，对样品的发光性质进行测试。通过对样品进行XPS测试表明，通过对样品进行退火处理，可增强In-S键结合强度，进一步降低表面态密度。最后，利用原子力显微镜（AFM）对样品的表面形貌进行表征。

Abstract: A novel surface passivation of InP, combined wet passivation to dry passivation was proposed. In this work, the density of surface state was decreased efficiently so the strong luminescence property was obtained. The stability of InP surface was confirmed, which was exposed in air some day. Photoluminescence (PL) was performed in room temperature to achieve intensity measures. The high-resolution X-ray photoelectron spectroscopy (XPS) for InP revealed that a In-S bonding was increased with the annealing treatment. The density of surface was decreased further. The surface morphology of the sample was reflected with atomic force microscopy (AFM).