Zhang Lin, Xie Gang, Liu Yuxiao, Zhang Huixia, Liang Kun, Yang Ru, Han Dejun. Recent research progress of silicon photomultiplier with epitaxial quenching resistor[J]. Infrared and Laser Engineering, 2022, 51(7): 20210587. DOI: 10.3788/IRLA20210587
Citation: Zhang Lin, Xie Gang, Liu Yuxiao, Zhang Huixia, Liang Kun, Yang Ru, Han Dejun. Recent research progress of silicon photomultiplier with epitaxial quenching resistor[J]. Infrared and Laser Engineering, 2022, 51(7): 20210587. DOI: 10.3788/IRLA20210587

Recent research progress of silicon photomultiplier with epitaxial quenching resistor

  • The Novel Device Laboratory (NDL) of Beijing Normal University has been developing a silicon photomultiplier with an epitaxial quenching resistor (EQR SiPM), which has a compact structure and a relatively simple fabrication process. Recently, to meet the requirements of nuclear medicine imaging, NDL has successfully developed an EQR SiPM with a microcell size of 15 μm and an active area of 9 mm2 by optimizing the device structure and fabrication technology. Compared to previous devices of the same type, the dark count rate (DCR) of the EQR SiPM is further reduced while still maintaining high photon detection efficiency (PDE). At an ambient temperature of 20 ℃ and an operating overvoltage of 7 V, the typical DCR is 226 kHz/mm2, and the peak PDE is 46%. In addition, to further increase the dynamic range of the EQR SiPM, NDL has developed an EQR SiPM with a microcell size of 6 μm, an active area of 9 mm2 and a microcell number of 244720. At an ambient temperature of 20 ℃ and an operating overvoltage of 7 V, the typical DCR is 240 kHz/mm2, and the peak PDE is 28%. It has large dynamic range that is very suitable for the measurement of high-energy cosmic rays and other applications in hadron calorimeters.
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