Analysis on factors affecting energy stability of excimer laser for lithography

The development of the dual-chamber amplification structure of ArF excimer laser in Cymer was reviewed. Corresponding pulse energy stability was also concluded. The effect of dual-chamber amplification mechanism on pulse energy stability was analyzed. Especially, the MOPRA structure and the MOPA structure are compared. The gas components, proportion of working gases and gas flow rate between electrodes in the discharge chamber,which have strong influence on the pulse energy stability, were also discussed. Corresponding measures were presented to improve energy stability. Finally, the energy servo system was introduced briefly.